Study of the interaction between a zirconium thin film and an EN C100 steel substrate: Temperature effect

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TitreStudy of the interaction between a zirconium thin film and an EN C100 steel substrate: Temperature effect
Type de publicationJournal Article
Year of Publication2016
AuteursBenouareth K, Tristant P, Jaoul C, Le Niniven C, Nouveau C, Dublanche-Tixier C, Bouabellou A
JournalVACUUM
Volume125
Pagination234-239
Date PublishedMAR
Type of ArticleArticle
ISSN0042-207X
Mots-clésDiffusion, hardness, heat treatment, Sputtering, Zirconium carbide
Résumé

Zirconium thin films were grown on high carbon steel substrates EN C100 (1%wt. of carbon) by RF magnetron sputtering. In order to study the diffusivity of the film/substrate system as a function of the temperature, 1 h vacuum annealing was carried out for different temperatures between 600 degrees C and 1100 degrees C. The films were then analyzed by X-ray diffraction, scanning electron microscopy, glow discharge optical emission spectroscopy (GDOES) and nanoindentation. The obtained results showed a progressive transformation of zirconium film to.zirconium carbide. Carbon atoms diffusion from substrate toward the film induced this transformation. The sample annealed at 900 C exhibited the best mechanical properties (H = 17 GPa and E = 220 GPa). Samples treated at higher temperature were affected by oxidation and high microporosity. Even if the conversion is incomplete, annealing significantly promotes adhesion of the film on the substrate. (C) 2015 Elsevier Ltd. All rights reserved.

DOI10.1016/j.vacuum.2015.11.002