Epitaxial growth of the intermetallic compound NiAl on low-index Ni surfaces in Ni/A1 reactive multilayer nanofoils

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TitreEpitaxial growth of the intermetallic compound NiAl on low-index Ni surfaces in Ni/A1 reactive multilayer nanofoils
Type de publicationJournal Article
Year of Publication2018
AuteursBaras F., Politano O.
JournalACTA MATERIALIA
Volume148
Pagination133-146
Date PublishedAPR 15
Type of ArticleArticle
ISSN1359-6454
Mots-clésEpitaxial growth, Molecular dynamics simulations, Multilayer thin films, Ni dissolution in Al, Nucleation of phase transformations
Résumé

Crystal growth in the case of self-propagating reactions in Ni-Al nanofoils was investigated by means of molecular dynamics simulations. We studied the heteroepitaxial growth of NiAI on Ni during mixing and alloying at interfaces. Three low-index Ni surfaces were considered. In the case of the (001) and (111) orientations of Ni, a layer-by-layer formation occurred. Four orientations of NiAl grains were observed in (001) and six in (101). The orientation relationships of NiAI(101) with Ni(001) and with Ni(111) were derived. For the (101) orientation of Ni, massive crystallization was observed in the form of grains tilted in relation to the interface. The microstructure evolution was tracked along with grain orientation dynamics. In all cases, a simple geometric construction based on the relationship between unit cells of Ni and NiAI explains crystal growth specificities. The nucleation process and growth kinetics were also investigated. The present study proves that crystal growth varies considerably, in relation to Ni orientation. (c) 2018 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

DOI10.1016/j.actamat.2018.01.035