Development of a Cryogenic Silicon Cavity Stabilized Laser
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Titre | Development of a Cryogenic Silicon Cavity Stabilized Laser |
Type de publication | Conference Paper |
Year of Publication | 2018 |
Auteurs | Marechal B., Talla S.FTetsing, Millo J., Rocher C., Bourgeois P.-Y, Goavec-Merou G., Lacroute C., Rubiola E., Kersale Y. |
Conference Name | 2018 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM (IFCS) |
Publisher | IEEE; IEEE Ultrason Ferroelectr & Frequency Control Soc; SDI |
Conference Location | 345 E 47TH ST, NEW YORK, NY 10017 USA |
ISBN Number | 978-1-5386-3214-7 |
Résumé | In this paper, we present the current development status of a cavity stabilized laser at 1550 nm. The expected thermal noise limit of the silicon Fabry-Perot cavity is 3 x 10(-17) at 17 K in terms of fractional frequency instability. We cooled it to its thermal expansion turning point, measured at 18.1 K, with a pulse-tube based cryocooler. Thanks to the thermal filtering and the temperature control of the cavity, the temperature induced fractional frequency instability is below the thermal noise up to 1000 s of integration time. We also discuss the vibration induced limitations, the thermal characterization of the cryocooler and the digital servo implementation and performances. |