Seeding Molecular Rotators on a Passivated Silicon Surface

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TitreSeeding Molecular Rotators on a Passivated Silicon Surface
Type de publicationJournal Article
Year of Publication2014
AuteursGuillermet O, Mahmood A, Yang J, Echeverria J, Jeannoutot J, Gauthier S, Joachim C, Cherioux F, Palmino F
JournalCHEMPHYSCHEM
Volume15
Pagination271-275
Date PublishedFEB 3
Type of ArticleArticle
ISSN1439-4235
Mots-clésmolecular rotator, scanning probe microscopy, silicon surface, simulation, supramolecular chemistry
Résumé

Thermally activated rotation of single molecules adsorbed on a silicon-based surface between 77 and 150 K has been successfully achieved. This remarkable phenomenon relies on a nanoporous supramolecular network, which acts as a template to seed periodic molecule rotors on the surface. Thermal activation of rotation has been demonstrated by STM experiments and confirmed by theoretical calculations.

DOI10.1002/cphc.201301015