Growth Mechanism during the Early Stages of electrodeposition of Bismuth telluride films
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Titre | Growth Mechanism during the Early Stages of electrodeposition of Bismuth telluride films |
Type de publication | Journal Article |
Year of Publication | 2015 |
Auteurs | Zimmer A, Broch L, Boulanger C, Stein N |
Journal | ELECTROCHIMICA ACTA |
Volume | 174 |
Pagination | 376-383 |
Date Published | AUG 20 |
Type of Article | Article |
ISSN | 0013-4686 |
Mots-clés | Bismuth telluride, electrocrystallization, first steps of electrodeposition, In-situ ellipsometry, Nucleation |
Résumé | An optical-electrochemical study on the initial stages of bismuth telluride (Bi2Te3) electrodeposition onto gold substrate is presented in this work. Numerical methods were applied on both electrochemical and optical data to obtain the relevant kinetic parameters from electrocrystallization theoretical equations and ellipsometric models in order to describe this system in the relevant 0-15 seconds range. The in-situ ellipsometry and electrodeposition analysis reveals a three-step mechanism. After an induction time including the double layer charge, the formation of a monolayer of tellurium is highlighted, followed by the adatom surface diffusion. Then, the growth of three-dimensional Bi2Te3 crystallites is observed according a progressive nucleation and a linear growth rate. Experimental and theoretical details about each technique are given and analyzed. (C) 2015 Elsevier Ltd. All rights reserved. |
DOI | 10.1016/j.electacta.2015.05.190 |