Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography

Affiliation auteursAffiliation ok
TitrePerformance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography
Type de publicationJournal Article
Year of Publication2017
AuteursJaramillo J, Zarzycki A, Galeano J, Sandoz P
JournalSENSORS
Volume17
Pagination278
Date PublishedFEB
Type of ArticleArticle
Mots-clésG-Code, high-resolution positioning, laser direct writing, microfabrication, photolithography, xy-stage
Résumé

This article concerns the characterization of the stability and performance of a motorized stage used in laser direct writing lithography. The system was built from commercial components and commanded by G-code. Measurements use a pseudo-periodic-pattern (PPP) observed by a camera and image processing is based on Fourier transform and phase measurement methods. The results report that the built system has a stability against vibrations determined by peak-valley deviations of 65 nm and 26 nm in the x and y directions, respectively, with a standard deviation of 10 nm in both directions. When the xy-stage is in movement, it works with a resolution of 0.36 mu m, which is an acceptable value for most of research and development (R and D) microtechnology developments in which the typical feature size used is in the micrometer range.

DOI10.3390/s17020278