Automatic defect localization in VLSI circuits: A fusion approach based on the Dempster-Shafer theory

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TitreAutomatic defect localization in VLSI circuits: A fusion approach based on the Dempster-Shafer theory
Type de publicationConference Paper
Year of Publication2017
AuteursBoscaro A., Jacquir S., Sanchez K., Perdu P., Binczak S.
Conference Name2017 20TH INTERNATIONAL CONFERENCE ON INFORMATION FUSION (FUSION)
PublisherXian Jiaotong Univ; Int Soc Informat Fus; SATPRO; CEEC; China Gezhouba Grp No 3 Engn Co Ltd; Minist Educ, Key Lab Informat Fus Technol; Hangzhou Dianzi Univ; China Elect Technol Grp Corp, Sci & Technol Informat Syst Engn Lab, 28 Res Inst; China Elect Tech
Conference Location345 E 47TH ST, NEW YORK, NY 10017 USA
ISBN Number978-0-9964-5270-0
Mots-clésevidence theory, Fault detection and identification, Multi-sensor data fusion, VLSI analysis
Résumé

Defect localization in Very Large Integration Circuits (VLSI) requires to use multi-sensor information such as electrical waveforms, emission microscopy images and frequency mapping in order to detect, localize and identify the failure. Each sensor provides a specific kind of feature modeling the evidence. Thus, the defect localization in VLSI can be summarized as a problem of data fusion with heterogeneous and imprecise information. This study illustrates how to reproduce the human decision for modeling and fusing the different multi-sensor features by using the Demspter-Shafer theory. We propose not only an automatic decision rule for mass functions computing but also confidence intervals to quantify the final decision and to bring a decision help for the analysts expertise. Finally, a case of study is reported to attest the expert decision reproducibility.