Bi4V2O11 and BITAVOX.20 coatings deposited by reactive magnetron sputtering
| Affiliation auteurs | !!!! Error affiliation !!!! |
| Titre | Bi4V2O11 and BITAVOX.20 coatings deposited by reactive magnetron sputtering |
| Type de publication | Journal Article |
| Year of Publication | 2015 |
| Auteurs | Dereeper E., Briois P., Vannier R.-N, Billard A. |
| Journal | MATERIALS CHEMISTRY AND PHYSICS |
| Volume | 153 |
| Pagination | 9-16 |
| Date Published | MAR 1 |
| Type of Article | Article |
| ISSN | 0254-0584 |
| Mots-clés | Crystal structure, Electrochemical techniques, Oxides, Physical vapour deposition, Thin films |
| Résumé | Bi4V2O11 and BITAVOX.20 films were deposited by magnetron sputtering in reactive conditions from Bi, V and Ta metallic targets. The influence of sputtering conditions on the films composition was studied and then a structural study at variable temperature was carried out. Before annealing, the films were amorphous and the gamma-Bi4V2O11 structure was obtained for a treatment at temperatures over 550 degrees C whereas BITAVOX.20 started to crystallise at 425 degrees C. In both cases, crystallisation occurred via an intermediate fluorite phase presenting a tetragonal deformation as already observed for other compounds with the Aurivillius structure. (C) 2014 Elsevier B.V. All rights reserved. |
| DOI | 10.1016/j.matchemphys.2014.12.021 |