Biblio
12 resultats trouvés
Filtres: Auteur is Sun, Hui [Clear All Filters]
Ag composition gradient CuCr0.93Mg0.07O2/Ag/CuCr0.93Mg0.07O2 coatings with improved p-type optoelectronic performances. JOURNAL OF MATERIALS SCIENCE. 52:11537-11546.
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2017. Contribution of enhanced ionization to the optoelectronic properties of p-type NiO films deposited by high power impulse magnetron sputtering. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY. 39:5285-5291.
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2019. .
2021.
Mechanical properties, thermal stability and oxidation resistance of HfC/a-C:H films deposited by HiPIMS. JOURNAL OF ALLOYS AND COMPOUNDS. 847:156538.
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2020. Microstructure and properties of nanostructured YSZ coating prepared by suspension plasma spraying at low pressure. SURFACE & COATINGS TECHNOLOGY. 261:318-326.
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2015. Microstructures and optoelectronic properties of CuxO films deposited by high-power impulse magnetron sputtering. JOURNAL OF ALLOYS AND COMPOUNDS. 688:672-678.
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2016. One-step preparation of Ag-incorporated BiVO4 thin films: plasmon-heterostructure effect in photocatalytic activity enhancement. APPLIED SURFACE SCIENCE. 580:152253.
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2022. Optoelectronic properties of delafossite structure CuCr0.93Mg0.07O2 sputter deposited coatings. JOURNAL OF PHYSICS D-APPLIED PHYSICS. 49:185105.
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2016. p-type cuprous oxide thin films with high conductivity deposited by high power impulse magnetron sputtering. CERAMICS INTERNATIONAL. 43:6214-6220.
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2017. Structure, mechanical and tribological properties, and oxidation resistance of TaC/a-C:H films deposited by high power impulse magnetron sputtering. CERAMICS INTERNATIONAL. 46:24986-25000.
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2020. Thickness-dependent optoelectronic properties of CuCr0.93Mg0.07O2 thin films deposited by reactive magnetron sputtering. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 63:295-302.
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2017. .
2015.